molecular-beam epitaxy分子束外延
the molecular-beam epitaxy growth equation分子束外延生长方程
Molecular Beam Epitaxy Facility分子束磊晶系统
molecular beam epitaxy growth分子束外延生长
molecular beam epitaxy technology分子束外延技术
laser molecular beam epitaxy激光分子束外延;用激光分子束外延
organic molecular beam epitaxy有机分子束外延
silicon molecular beam epitaxy硅分子束外延
MBE Molecular Beam Epitaxy分子束外延
The former mainly includes sputtering, PLD(pulse laser deposition) and molecular beam epitaxy, while the latter includes chemical vapor deposition, spray pyrolysis and sol-gel methods and so on.
前者主要包括溅射、脉冲激光沉积和分子束外延等;后者则涵盖化学气相沉积、喷雾热解和溶胶-凝胶法等。
参考来源 - ZnO薄膜的制备方法、性质和应用Up to now, many of different techniques such as sputtering、 reactive thermal evaporation、 spray pyrolysis、 pulsed laser deposition、 metal organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE) have been used in the preparation of nano-ZnO.
近年来，ZnO薄膜的制备有许多先进的沉积和生长技术，如分子束外延（MBE）、磁控溅射、电子束蒸发、金属有机化学气相沉积（MOCVD）、电化学、高温裂解、激光脉冲沉积（PLD）等方法。
参考来源 - 等离子体辅助电子束蒸发金属Zn制备纳米ZnO薄膜机构和光学性质的研究